Materials
    Alumina
    AlN
    Sapphire
    SiC
    Quartz
    Si3N4
    And Others

Size
Up to 22" OD

Flatness
Better than 2HLB

Parallelism
Better than 50 millionths

Vacuum Pattern
Pin or Grooves

 

 

 

 

 

 

 

Semiconductor

Ceramic Wafer Handling Devices

Choose ceramic materials exhibiting higher specific stiffness and better dimensional stability for your critical wafer handling applications.


100mm wafer vacuum chuck set against 300mm wafer vacuum chuck

Special wear coatings such as DLC are available for particle control; metallized surfaces and buried conductor patterns are available for heating or electrostatic work holding.

 
©2005 Balamat Company. All Rights Reserved